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  1.  19
    Growth mechanism of tantalum silicides by interdiffusion.Soumitra Roy & Aloke Paul - 2012 - Philosophical Magazine 92 (34):4215-4229.
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  2.  23
    Diffusion pattern in MSi2and M5Si3silicides in group VB and VIB refractory metal-silicon systems.Soumitra Roy, Soma Prasad, Sergiy V. Divinski & Aloke Paul - 2014 - Philosophical Magazine 94 (14):1508-1528.
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    Reactive diffusion in the Ti–Si system and the significance of the parabolic growth constant.Soumitra Roy, Sergiy V. Divinski & Aloke Paul - 2014 - Philosophical Magazine 94 (7):683-699.
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